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INTRODUCTION

attoAFMsolution

 

attoAFM I

 

attoAFM III

attoSEMmanipulators

Application Notes

 

 


APPLICATION NOTES

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3.
In-situ characterization of exposed e-beam resist using novel AFM technique In this application note, the impact of e-beam exposure on PMMA (poly-methyl methacrylate) is characterized by an in-situ application of attocube’s attoAFM III in a Raith eLINE electron beam lithography system (EBL).

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2.
Stress-strain behaviour of fibrous biological material
measured using an AFM/SEM hybrid
attocube‘s cantilever-based attoAFM I was used inside a FEI Quanta 3D Scanning Electron Microscope (SEM) to perform nanometer-scale tensile measurements of individual collagen fibrils.

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1.
In-situ AFM measurements of SrTiO3 and Co particles
inside an electron microscope.
attocube‘s tuning fork based attoAFM III was used inside inside a LEO 1530 scanning electron microscope (SEM) to investigate magnetic Co particles confined in
an organic matrix..

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